Lithography

Work of Moshood Morakinyo (Kayode)

Spectral lines of gold nanoparticle samples

Controlled deposition and positioning of gold nanoparticles.

CD Fluctuation in E-Beam Lithography

The critical dimension (CD) of holes varied for a constant dose of 30 μC. The expected diameter is 50 nanometers. The experimental results can be seen below.

Variation in critical dimensions of patterning process

Evaporation Induced Deposition of Gold NPs

Gold nanoparticles filled the holes created in a 185 nanometer (nm) PMMA photoresist. A 1:3 mixture of MIBK and IPA was used as a developer. Some gold nanoparticles aggregated and stuck to the hole walls. 100% filling factor was achieved with 50nm Gold particles.

Gold nanoparticles filling holes created in a 185 nanometer (nm) PMMA photoresist