A SEM/FIB workstation equipped with gas injectors, EDS, STEM, and TEM sample preparation (OMNI probe, flip stage, etc.) capabilities. The system is capable of nano-depositing, nano-prototyping, TEM sample preparation, nano-characterization, and nano-analysis with 2-nm imaging resolution and 15-nm milling resolution.
Key features
- HT (e-beam): 1~30kV
- HT (i-beam): 10kV~30kV
- Resolution: 2 nm @ 5kV (e-beam)
- Resolution: ~7 nm (i-beam)
- Milling Resolution:15 nm
- Deposition Resolution: ~50 nm
Application- TEM sample preparation
- Ion/e-beam deposition
- Nanofabrication
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